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| Structure
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Roth & Rau AG |
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| Dünnschicht Solar GmbH |
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100% |
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| Roth & Rau Microsys. GmbH |
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100% |
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| CTF Solar GmbH |
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100% |
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| Shanghai Trading Co. Ltd. |
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100% |
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| Singapore Pte. Ltd. |
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100% |
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| Korea Co. Ltd. |
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100% |
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| Switzerland AG |
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100% |
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| Australia Pty Ltd. |
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100% |
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| USA Inc. |
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100% |
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| India Pvt. Ltd. |
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100% |
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01 |
High Tech for Surfaces
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Innovative Products and Technologies for Future-Oriented Applications |
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The UniLab system is a laboratory system that can be used for many plasma and ion beam assisted etching and coating processes (for example: PECVD, RIE, IBE, magnetron sputtering) in the laboratory scale. At that, depending on the type of the process, the processable substrate size spans from a few square centimeters up to a diameter of 100 mm. The plants can be equipped with various plasma and ion beam sources and, in particular, can be individually adapted with respect to the substrate handling. Due to its compact design, the UniLab system saves space and can be easily installed.
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 Topic
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Compact Plasma Plant for surface treatment, plasma etching and plasma cleaning
- RF- or microwave-excited plasma source
- Suitable for processes based on inert and/or reactive gasses
- Large front door for easy loading and unloading
- Easy installation, manipulation and maintenance
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Topic
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Plasma etching equipment
PRINCIPLE
· Compact, rack mounted process system with RF or microwave excited plasma sources, front door for loading
APPLICATION
· Plasma etching
TECHNOLOGY
· Plasma etching with noble gases or RIE with fluorine chemistry (e.g. edge isolation in the solar cell production sequence)
SUBSTRATE
· 3-dimensional substrates up to 150 x 150 x 150 mm³ or wafers and other flat samples up to 4” in diameter
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Topic
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Entrepreneur
des Jahres® |
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Winner 2009
Nominated for the
World Entrepreneur
of the Year 2010
official
site
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Events |
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16.09.2010 |
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Anniversary "20 Years of AIS Automation Dresden"
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