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| Structure
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Roth & Rau AG |
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| Dünnschicht Solar GmbH |
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100% |
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| Roth & Rau Microsys. GmbH |
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100% |
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| CTF Solar GmbH |
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100% |
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| Shanghai Trading Co. Ltd. |
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100% |
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| Singapore Pte. Ltd. |
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100% |
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| Korea Co. Ltd. |
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100% |
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| Switzerland AG |
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100% |
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| Australia Pty Ltd. |
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100% |
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| USA Inc. |
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100% |
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| India Pvt. Ltd. |
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100% |
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01 |
High Tech for Surfaces
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Innovative Products and Technologies for Future-Oriented Applications |
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PRINCIPLE
- Microwave plasma sources for the use in the rough vacuum area (10-2…1 mbar)
APPLICATIONS
- PECVD (in particular, insulator coatings)
- RIE with fluorine chemistry
- In combination with RF bias or without bias
SPECIFICATION
- Sources for internal mount, opposite flanges at both sides of the process chamber required
- Width is adaptable to the chamber dimensions from 300 mm to about 1500 mm
- Permanent magnet field
- Microwave coupling via a quartz window
- Integrated gas showers for homogeneous gas distribution
- Compact microwave generator (1, 2 … 3 kW) heads
- For CW and pulse mode
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 Topic
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Entrepreneur
des Jahres® |
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Winner 2009
Nominated for the
World Entrepreneur
of the Year 2010
official
site
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Events |
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16.09.2010 |
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Anniversary "20 Years of AIS Automation Dresden"
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