 |
| Structure
|
|
|
|
 |
Roth & Rau AG |
|
 |
|
|
|
|
|
|
|
|
|
| Dünnschicht Solar GmbH |
|
100% |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
|
| Roth & Rau Microsys. GmbH |
|
100% |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
| CTF Solar GmbH |
|
100% |
|
|
|
|
|
|
|
|
| Shanghai Trading Co. Ltd. |
|
100% |
|
|
|
|
|
|
|
|
| Singapore Pte. Ltd. |
|
100% |
|
|
|
|
|
|
|
|
| Korea Co. Ltd. |
|
100% |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
| Switzerland AG |
|
100% |
|
|
|
|
|
|
|
|
| Australia Pty Ltd. |
|
100% |
|
|
|
|
|
|
|
|
|
|
|
|
|
|
| USA Inc. |
|
100% |
|
|
|
|
|
|
|
|
| India Pvt. Ltd. |
|
100% |
|
|
|
|
|
|
|
 |
 |
|
|
|
| |
|
01 |
High Tech for Surfaces
|
|
|
| |
 |
 |
Innovative Products and Technologies for Future-Oriented Applications |
|
|
| |
|
|
|
|
 |
· Flange mounted, compact plasma source with flat-coil arrangement
· Gas shower incorporated in the mounting flange
· RF coupling by a quartz window
· Operation pressure range 10-3...0,1 mbar, operating on inert, reactive and corrosive gases
· Suitable for substrates with a diameter up to 300mm
|
 Topic
ICP Source
PRINCIPLE
- Inductively coupled RF plasma source
APPLICATIONS
- RIE with fluorine and chlorine chemistry
- PECVD (in particular, insulator coatings)
- In combination with RF bias or without bias
SPECIFICATION
- Flange-mounted source
- Diameter: 400 mm
- 4 planar antennas with power splitters, silica-glass coupling window
- RF power: Up to 2.5 kW
|
Topic
|
|
|
|
|
 |
|
 |
|
|
|
|
Entrepreneur
des Jahres® |
|
|
|
Winner 2009
Nominated for the
World Entrepreneur
of the Year 2010
official
site
|
|
|
|
|
 |
|
| |
|
|
| |
| |
|
|
Events |
|
|
|
16.09.2010 |
|
|
Anniversary "20 Years of AIS Automation Dresden"
|
|
| |
|
|
|
|
|
