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| Structure
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Roth & Rau AG |
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 |
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| Dünnschicht Solar GmbH |
|
100% |
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| Roth & Rau Microsys. GmbH |
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100% |
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| CTF Solar GmbH |
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100% |
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| Shanghai Trading Co. Ltd. |
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100% |
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| Singapore Pte. Ltd. |
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100% |
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| Korea Co. Ltd. |
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100% |
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| Switzerland AG |
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100% |
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| Australia Pty Ltd. |
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100% |
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| USA Inc. |
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100% |
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| India Pvt. Ltd. |
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100% |
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01 |
High Tech for Surfaces
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Innovative Products and Technologies for Future-Oriented Applications |
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Linear Ion Beam Sources
PRINCIPLE
- Highly efficient electrodeless plasma excitation through Electron Cyclotron Resonance (ECR), modularly structured plasma chamber
AREAS OF APPLICATION
- Reactive and chemically assisted large-area ion beam etching (RIBE, CAIBE) as well as ion beam assisted large-area deposition of thin coatings (IBS, IBAD) or in-line- processes
SPECIFICATION
- Flange-mounted ion beam source with rectangle flange
- Beam width is scaleable between 400 mm and 2000 mm
- Ion beam parameters: Up to 2.0 keV, > 700 mA
- Neutralization by means of plasma bridge neutralizers or beam switch
|
 Topic
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Entrepreneur
des Jahres® |
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Winner 2009
Nominated for the
World Entrepreneur
of the Year 2010
official
site
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Events |
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16.09.2010 |
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Anniversary "20 Years of AIS Automation Dresden"
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