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Ion Beam Source Overview
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  Structure
Roth & Rau AG
SLS Solar Line Saxony
51%
Dünnschicht Solar GmbH
100%
AIS Automation GmbH
100%
Muegge-electronic GmbH
100%
Roth & Rau Microsys. GmbH
100%
Roth & Rau Italy
100%
CTF Solar GmbH
100%
Shanghai Trading Co. Ltd.
100%
Singapore Pte. Ltd.
100%
Korea Co. Ltd.
100%
Roth & Rau Ortner
100%
Switzerland AG
100%
Australia Pty Ltd.
100%
Romaric Corporation
100%
USA Inc.
100%
India Pvt. Ltd.
100%
 
01 High Tech for Surfaces
 
 
Innovative Products and Technologies for Future-Oriented Applications
 
     
Ion Beam Source Overview





The ion beam sources represent the key component of each ion beam process. Roth & Rau offers various types of filamentless and Kaufman-type ion beam sources having beam diameters of 40 mm to 220 mm. In case of the Kaufman-type ion beam sources, hot cathodes are used for the plasma excitation. These sources are robust and can be easily operated, but require a frequent maintenance (cathode replacement) and are merely restrictedly applicable to processes with reactive gasses. Filamentless ion beam sources (i.e. electrodeless ion beam sources where high frequency or microwave sources are used) do not have these restrictions and, therefore, have a long endurance even in case of an operation with reactive gasses.

To minimize the ion beam contamination by material sputtered from the ion beam source walls, the plasma chamber consists of aluminum oxide ceramics that has a very low sputtering rate and is chemically resistant against the most of the reactive gasses.

All ion beam sources are broad beam ion beam sources and, depending on the application, can be equipped with different 2- or 3-grid extraction systems (plane or focusing multiaperture grids). By default, the grids consist of graphite. Molydenum grids are available too. The grid systems are self-adjusting and can be easily exchanged.

Due to the source and grid design adaptation to the process requirements the sources can be versatilely used for coating, etching, substrate pre-cleaning, surface modification as well as ion-beam-assisted processes.


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Entrepreneur
des Jahres®
Winner 2009

Nominated for the
World Entrepreneur
of the Year 2010

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16.09.2010
Anniversary "20 Years of AIS Automation Dresden"
 
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