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Roth & Rau AG |
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| Dünnschicht Solar GmbH |
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100% |
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| Roth & Rau Microsys. GmbH |
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100% |
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| CTF Solar GmbH |
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100% |
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| Shanghai Trading Co. Ltd. |
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100% |
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| Singapore Pte. Ltd. |
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100% |
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| Korea Co. Ltd. |
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100% |
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| Switzerland AG |
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100% |
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| Australia Pty Ltd. |
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100% |
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| USA Inc. |
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100% |
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| India Pvt. Ltd. |
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100% |
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01 |
High Tech for Surfaces
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Innovative Products and Technologies for Future-Oriented Applications |
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Plasma sources form the key components of plasma process systems. From the first beginning, Roth & Rau focused on the source development. The portfolio comprises a 300mm ICP source, different types of ECR plasma sources and linear microwave-excited plasma sources for large-area and in-line plasma processes.
Both ECR plasma sources and ICP sources have excellent properties such as:
- High ionization degree and high densities of ions, radicals and excited and dissociated particles at a low working pressure in a range from <10-3 mbar to 0.1 mbar
- No restrictions with respect to use of reactive and corrosive process gasses
- Suitability for many RIE and PECVD methods and for surface modification and cleaning
The ECR plasma sources made by Roth & Rau are characterized by the following:
- Compact construction or design as linear plasma source
- Low weight
- mounting in any direction
- High process stability (no cavity resonator concept, no mode hopping)
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 Topic
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Entrepreneur
des Jahres® |
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Winner 2009
Nominated for the
World Entrepreneur
of the Year 2010
official
site
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Events |
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16.09.2010 |
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Anniversary "20 Years of AIS Automation Dresden"
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