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| Structure
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Roth & Rau AG |
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| Dünnschicht Solar GmbH |
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100% |
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| Roth & Rau Microsys. GmbH |
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100% |
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| CTF Solar GmbH |
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100% |
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| Shanghai Trading Co. Ltd. |
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100% |
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| Singapore Pte. Ltd. |
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100% |
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| Korea Co. Ltd. |
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100% |
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| Switzerland AG |
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100% |
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| Australia Pty Ltd. |
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100% |
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| USA Inc. |
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100% |
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| India Pvt. Ltd. |
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100% |
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01 |
High Tech for Surfaces
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Innovative Products and Technologies for Future-Oriented Applications |
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Flexibly Configurable Plasma Process Plant
TECHNOLOGY
- RIE processes with fluorine chemistry and/or inert gasses or PECVD of insulator coatings (for example: SiN, SiO, SiC)
APPLICATIONS
- Large-area PECVD and RIE processes for the research and for the application in the area of photovoltaics, displays, optics, etc.
SUBSTRATES
- Flat substrates having a size of 200 x 300 sq.mm or 400 x 450 sq.mm
PLANT PARAMETERS
- Linear microwave-excited plasma sources
- Substrate holder optionally with or without RF bias, substrate cooling/heating
- Substrate handling preferably with carrier
- Load-lock system with automatic single substrate transfer
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Downloads:
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11729426271.pdf (214 kB)
ANOMALOUS THERMAL BEHAVIOUR OF SURFACE PASSIVATION
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 Topic
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Large-Area RIE Plant
TECHNOLOGY
- RIE processes with fluorine or chlorine chemistry
APPLICATION POSSIBILITIES
- RIE of plane substrates made of metals, glasses or other electrically conductive or insulating materials
SUBSTRATES
- Flat substrates having a size of up to 500 x 550 sq.mm
PLANT PARAMETERS
- Aluminum process chamber
- Linear microwave-excited plasma sources in combination with RF bias
- Substrate cooling/heating
- Substrate handling with carrier
- Load-lock system with automatic single carrier transfer
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Topic
One Concept for Research and Industry
The AK 400, AK 800 and AK 1000 systems are universally applicable plasma process plants that are suitable for coating processes (PECVD, plasma polymerization) as well as for plasma etching processes (RIE). In particular, the plants are used for the process development for large-area and in-line plasma processes. Typical substrate dimensions are 200 mm x 300 mm, 400 mm x 400 mm or 550 mm x 550 mm. Due to the use of industry-compatible plasma sources, new technologies can be easily and quickly scaled to industrial dimensions.
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Topic
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Entrepreneur
des Jahres® |
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Winner 2009
Nominated for the
World Entrepreneur
of the Year 2010
official
site
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Events |
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16.09.2010 |
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Anniversary "20 Years of AIS Automation Dresden"
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