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| Structure
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Roth & Rau AG |
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| Dünnschicht Solar GmbH |
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100% |
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| Roth & Rau Microsys. GmbH |
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100% |
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| CTF Solar GmbH |
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100% |
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| Shanghai Trading Co. Ltd. |
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100% |
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| Singapore Pte. Ltd. |
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100% |
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| Korea Co. Ltd. |
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100% |
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| Switzerland AG |
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100% |
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| Australia Pty Ltd. |
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100% |
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| USA Inc. |
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100% |
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| India Pvt. Ltd. |
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100% |
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01 |
High Tech for Surfaces
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Innovative Products and Technologies for Future-Oriented Applications |
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- C2H2- or CH4-based PECVD process
- 300mm parallel plate arrangement (13.56 MHz)
- Substrate temperature: < 150 °C
- Deposition rate: 1 μm/h
- Use as anti-reflection coating on optical components in the infrared spectral range (night vision devices, distance sensors, etc.) and as passivation coating for planar p-n transitions in the microelectronics
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 Topic
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- Adjustable coating properties of diamond-like hard coatings up to graphite- or polymer-like coatings with low friction coefficient
- C2H2-based large-area ECR PECVD process
- Deposition rate: 1 μm/h
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Topic
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- Industrially used as anti-reflection coating and for the surface and bulk passivation of crystalline silicon solar cells
- Large-area in-line microwave plasma process
- Process gasses: SiH4 / NH3 in different composition
- Refraction index: Adjustable in a range from 1.9 to 2.2
- Deposition rate: 20…100 nm/min.
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Topic
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Entrepreneur
des Jahres® |
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Winner 2009
Nominated for the
World Entrepreneur
of the Year 2010
official
site
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Events |
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05.-09.09.2010 |
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25th European Photovoltaic Solar Energy Conference and Exhibition (EUPVSEC)
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