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	Overview Photovoltaics Level 2 SiNA® MAiA® Solar Cell Manufacturing Solutions Advanced Solar Cell Manufacturing for CdTe-Solar-Modules Plasma Technology for Thin Film Solar Module Manufacture Plasma and Ion Beam Technology Level 2 Process-Systems Level 3 IonScan IonSys Large Area Plasma MicroSys Specials UniLab Plasma and Ion Beam Sources Level 3 Ion sources Level 4 An overview Cyberis Sinaris Tamiris Tamiris Linear Series Plasma sources Level 4 ECR and ICP Source Overview ECR Sources ICP Sources Linear Plasma Sources Applications Level 3 Coatings Systems Ion Beam Deposition Ion Beam Etching Ion Beam Trimming Nanodot formation PECVD Reactive Ion Etching Newsletter Products Roth & Rau AG Investor Relations Press
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	Structure Roth & Rau AG SLS Solar Line Saxony 51% Dünnschicht Solar GmbH 100% AIS Automation GmbH 100% Muegge-electronic GmbH 100% Roth & Rau Microsys. GmbH 100% Roth & Rau Italy 100% CTF Solar GmbH 100% Shanghai Trading Co. Ltd. 100% Singapore Pte. Ltd. 100% Korea Co. Ltd. 100% Roth & Rau Ortner 100% Switzerland AG 100% Australia Pty Ltd. 100% Romaric Corporation 100% USA Inc. 100% India Pvt. Ltd. 100%   01 High Tech for Surfaces     Innovative Products and Technologies for Future-Oriented Applications         SiNA® - General features SINA® L Waver About 5 years ago, silicon nitride (SiN) coatings deposited by means of PECVD (Plasma Enhanced Chemical Vapor Deposition) were introduced as standard for the anti-reflection coating and passivation of silicon solar cells. At that, through the surface and volume passivation of the silicon wafer, a significant increase of the efficiency of the solar cells in a range of more than 10% is reached. With the SiNA® plant series, Roth & Rau offers SiN coating plants for various capacity requirements from the pilot manufacture (< 5 MWp) up to the fully automatic mass production (up to 100 MWp). The plants work in the in-line mode where the silicon wafers are processed on flat carriers. The coating deposition is realized in a continuous process in a silane/ammonia plasma using plasma sources specifically developed for this process. Thanks to a careful process optimization and experiences of many years under production conditions, the SiN coatings show very good passivation properties and an excellent homogeneity of coating thickness and optical parameters. The method is flexible with respect to wafer formats and materials (excellently suitable for thin wafers too) and is characterized by good automation possibilities, low operating costs and a high system availability. Downloads: beispiel.pdf (255 kB) Emitter Passivation Properties of PECVD Silicon Nitride on Silicon Solar Cells Jason Tan et al Industrial_PECVD_Silicon_Nitride_b.pdf (111 kB) Industrial PECVD Silicon Nitride - Surface and Bulk Passivation of Silicon Wafers Saul Winderbaum et al Characterisation_of_Industrial_Scale.pdf (435 kB) Characterisation of Industrial-Scale Remote PECVD SiN Depositions Saul Winderbaum et al Large_scale_industrial_ silicon_nitride_deposition.pdf (0 kB) Large scale industrial silicon nitride deposition at photovoltaic cells with linear microwave plasma sources Hermann Schlemm et al On_Combinig_Surface_and_Bulk_Passivation.pdf (243 kB) On Combinig Surface and Bulk Passivation of SiNx - H Layers for mc-Si Solar Cells W Soppe et al Passivation_of_Crystalline_Silicon_using_Silicon.pdf (333 kB) Passivation of Crystalline Silicon using Silicon Nitride Andrés Cuevas et al A_High_Throughput_PECVD_Reactor.pdf (293 kB) A High Throughput PECVD Reactor for Deposition of Passivating SiN Layers Wim Soppe et al Links: Topic Throughput (referring to 70 nm film thickness and refractive index 2,1) Model Wafer size mm Throughput(brutto) wafer/h Wafers per carrier Coating surface mm² Cycle time s Max. plasma sources SiNA XS 125 480 12 532x397 90 3   156 360 9 490x490 90 3 SiNA L ext. (4ps) 125 1800 36 802x802 72 4   156 1250 25 822x822 72 4 SiNA L ext. (6ps) 125 2356 36 802x802 55 6   156 1636 25 822x822 55 6 SiNA L ext. turbo 125 2880 36 802x802 45 6   156 2000 25 822x822 45 6 SiNA XXL 125 3546 66 1477x802 67 8   156 2418 45 1486x822 67 8 SiNA XXL turbo 125 4950 66 1477x802 48 16   156 3375 45 1486x822 48 16 Links: MAiA® Topic Entrepreneur des Jahres® Winner 2009 Nominated for the World Entrepreneur of the Year 2010 official site       Events 05.-09.09.2010 25th European Photovoltaic Solar Energy Conference and Exhibition (EUPVSEC)   all events (6)
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